How Polarization Impacts Wafer Electroplating Process?

Explore electrochemical polarization in wafer plating, its impact on deposition quality, and why it matters in semiconductor manufacturing.
How Polarization Impacts Wafer Electroplating Process

Table of Contents

During the metal electrodeposition process, if cathodic polarization is caused by slow mass transfer, it is known as concentration polarization as discussed previously; if cathodic polarization is caused by the sluggish discharge of metal ions on the electrode surface, it is referred to as cathodic electrochemical polarization.

What is polarization?

Polarization = Actual potential − Equilibrium potential

The essence of polarization is: the electrode’s reaction capability is insufficient to match the current you intend to apply → the potential is forced to deviate → electrical energy is “lost” in potential deviation.

Causes of electrochemical polarization:

  1. Intrinsically difficult discharge of metal ions

The electrochemical nature of the metal ion determines that its discharge (reduction) reaction on the cathode is inherently slow.

Example:

Copper (Cu²⁺) discharges relatively easily;

Zinc (Zn²⁺) and Nickel (Ni²⁺) discharge with more difficulty → requiring greater potential deviation (polarization) to drive the reaction.

  1. Presence of a “barrier layer” on the electrode surface

Metal ions must pass through an obstacle before discharging on the cathode (wafer). This barrier is usually caused by electroplating additives. Additives adsorb onto the cathode (wafer) surface and form an orderly “monolayer” or “multilayer barrier” on the surface.

Metal ions (e.g., Ni²⁺) must penetrate this molecular barrier before reduction can occur; this artificially slows the ion discharge rate → increases electrochemical polarization.

If the barrier layer is sparse, ions can penetrate quickly; if additive concentration is high and adsorption density is high → ion discharge rate drops significantly → larger negative shift in polarization potential.

Why intentionally introduce electrochemical polarization?

Benefits: 1. Suppresses crystallization rate 2. Enhances brightness 3. Levels recessed areas 4. Reduces co-deposition of impurities

End-of-DiskMFR-blog

Disclaimer: This article is created by the original author. The content of the article represents their personal opinions. Our reposting is only for sharing and discussion purposes and does not imply our endorsement or agreement. If you have any objections, please get in touch with us through the provided channels.

DiskMFR Field Sales Manager - Leo

It’s Leo Zhi. He was born on August 1987. Major in Electronic Engineering & Business English, He is an Enthusiastic professional, a responsible person, and computer hardware & software literate. Proficient in NAND flash products for more than 10 years, critical thinking skills, outstanding leadership, excellent Teamwork, and interpersonal skills.  Understanding customer technical queries and issues, providing initial analysis and solutions. If you have any queries, Please feel free to let me know, Thanks

Please let us know what you require, and you will get our reply within 24 hours.









    Our team will answer your inquiries within 24 hours.
    Your information will be kept strictly confidential.

    • Our team will answer your inquiries within 24 hours.
    • Your information will be kept strictly confidential.

    Let's Have A Chat

    Learn How We Served 100+ Global Device Brands with our Products & Get Free Sample!!!

    Email Popup Background 2