Key Differences: Wafer Plating, Electroforming, Electrolysis

Understand the core differences between wafer electroplating, electroforming, and electrolysis in semiconductor & precision manufacturing processes.
Key Differences: Wafer Plating, Electroforming, Electrolysis

Table of Contents

Electroplating and electroforming are often confused, but they have distinct purposes and processes. Here’s the difference, as well as the stages in wafer processing where electroplating is used:

Differences between Electroplating, Electroforming, and Electrolysis

ProcessElectroplatingElectroformingElectrolysis
PurposeDepositing a metal layer on a wafer surface (for decoration, corrosion protection, conductivity)Replicating a mold structure to create a detachable metal part (for structural fabrication)Decomposing compounds using electric current to purify or produce substances
Substrate RetentionSubstrate is permanently retainedMold is usually removedNo substrate needed, only electrolyte
Typical ApplicationsGold/silver plating, PCB copper platingMicroneedle arrays, electroformed masks, metal micro-moldsWater electrolysis (H₂, O₂ production), copper purification, electrolytic polishing
Deposition LocationWafer surfaceMold surface; structure remains after demoldingUsually involves anode dissolution and gas release
Metal UsageSurface coating for decoration/protectionPrecision structural replicationChemical extraction or decomposition

Simplified Summary:

  • Electroplating: Deposits a thin metal layer on a surface.
  • Electroforming: Deposits a thick metal layer, then removes the mold, leaving a freestanding metal structure.
  • Electrolysis: Similar in principle but not for depositing metal on the cathode; mainly for decomposition or purification.

Electroplating in Wafer Processing

Application StageElectroplated Metals
1. Copper interconnect (Damascene)Copper (Cu)
2. TSV fill (Through-Silicon Via)Copper (Cu)
3. Copper pillar processNickel/Gold (Ni/Au), Copper (Cu)
4. Solder ballsTin (Sn), Tin-Silver (SnAg), Gold (Au)
5. RDL (Redistribution Layer) platingCopper (Cu)
6. MEMS device fabricationGold (Au), Copper (Cu), Nickel (Ni)
7. TGV fillCopper (Cu)

Related:

  1. 1g of Silver Nanowire Can Wrap Around Earth 5 Times
  2. Step-by-Step Guide to Wafer Plating Rate Formula
  3. Wafer Electroplating: Key Laws You Must Follow Now
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DiskMFR Field Sales Manager - Leo

It’s Leo Zhi. He was born on August 1987. Major in Electronic Engineering & Business English, He is an Enthusiastic professional, a responsible person, and computer hardware & software literate. Proficient in NAND flash products for more than 10 years, critical thinking skills, outstanding leadership, excellent Teamwork, and interpersonal skills.  Understanding customer technical queries and issues, providing initial analysis and solutions. If you have any queries, Please feel free to let me know, Thanks

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